The present invention discloses an antistatic polyether ether ketone (PEEK) material. 60%–85% of PEEK resin, 1%–10% of modified graphene oxide, 0%–5% of sulfonated CNTs and 0.5%–3% of CNTs are premixed in a high-speed mixer, pelletized by a twin-screw extruder, and 10%–38% of glass fiber is added into the material system through a side feeder during the pelletization process to obtain the antistatic PEEK material. The modified graphene oxide is prepared by internal mixing of graphene oxide, sulfonated CNTs and epoxy resin in an ethylbenzene solution of aniline. By modifying graphene oxide and sulfonated CNTs, the present invention improves the dispersion effect of graphene oxide and sulfonated CNTs in the antistatic PEEK material, increases the binding force between graphene oxide, sulfonated CNTs and PEEK resin, makes the conductive material disperse more uniformly, and at the same time improves the stability of the dispersion effect of the conductive agent during molding and processing processes such as extrusion and injection molding.
Country Code: CN
Application Number: CN202410351716.X
